| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate cleaning apparatus which can completely remove fine particles on the surface of the substrate so that the cleaning action for the surface of the substrate can be improved. SOLUTION: An ultrasonic cleaning head 21 is positioned spaced at an interval D1 i.e., a first interval being a processing position, from the upper surface Wa of a substrate W which is rotated about the axis of rotation R of the substrate W. In the head 21, a vibration surface VF provided in a substrate surface WF imparts ultrasonic wave vibration to a cleaning liquid supplied into a gap K from nozzles 220, 230. A vibration element 213 disposed on a vibration plate 212 constituting the surface VF alternates with split electrodes 252a, 252b in a comb-teeth like form, and phase-deviated alternating-current drive signals are applied to the element 213 to generate traveling waves on the surface VF.
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