| 摘要 |
PROBLEM TO BE SOLVED: To prevent development liquid from being routed to the reverse side of a wafer that is being subjected to development treatment. SOLUTION: A movable routing prevention ring 4a that is installed concentrically with the rotary axis of a spin chuck 1 on the reverse side of a wafer 2 and has an up/down drive mechanism and a rotary drive mechanism is provided, a movable routing prevention ring 4a is raised so that it touches the outer-periphery side of the reverse side of the wafer 2, and is rotated in synchronization with the spin chuck 1 and prevents the routing of development liquid 3 to the reverse side of the wafer 2 during development treatment, the movable routing preventing ring 4a is lowered and is separated from the reverse side of the wafer 2 after the development treatment is completed, and synchronous rotation is stopped and rinse liquid is discharged from a back rinse nozzle 8 for back rinse treatment. The movable routing preventing ring 4a is moved up and down by a permanent magnet 5 and an electromagnet 7, and rotary drive is made by the slide fitting between a key part 9a and a key groove 9. |
