发明名称 |
METHOD FOR MANUFACTURING HETEROJUNCTION BIPOLAR TRANSISTOR |
摘要 |
A method of manufacturing a magnetoresistance element which can reproduce magnetic signals with higher sensitivity. The manufacturing method includes the steps of providing a vacuum below 10 -9 Torr in a film forming chamber for forming a nonmagnetic layer and ferromagnetic layer; performing plasma-etching of the surface of a substrate by using a mixture of a gas (a) containing at least oxygen or water introduced into the chamber and an Ar gas (b) introduced into the chamber introduced into the chamber in a vacuum state controlled to higher than 10 -9 Torr; and forming the nonmagnetic and ferromagnetic layers on the etched substrate by sputtering a prescribed target by using the mixture of the gases (a) and (b). |
申请公布号 |
KR20010105788(A) |
申请公布日期 |
2001.11.29 |
申请号 |
KR20000026712 |
申请日期 |
2000.05.18 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK, HAE SEONG |
分类号 |
H01L29/737 |
主分类号 |
H01L29/737 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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