| 摘要 |
A planarization film is formed on sensor portions on a semiconductor substrate, and color filters are formed on the planarization film at positions over the sensor portions. In this case, as color filters of yellow (Y) and cyan (C), dye based color filters are formed in an ordinary dying process of patterning a material and dying the pattern. On the other hand, as color filters of magenta (M) being low in light resistance and thermal resistance, pigment based color filters are formed by a color resist process using a pigment based coloring matter. Thus, there can be realized a solid state imaging device having the color filters allowed to improve characteristics such as light resistance and thermal resistance without changing the spectroscopic characteristic so much.
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