发明名称 Service method, service system and manufacturing/inspection apparatus
摘要 There is provided a service method, a service system and a manufacturing/inspection apparatus that can reduce the initial cost at the time of introducing a manufacturing/inspection apparatus and maintain the accuracy after introduction of the apparatus. In the service method for using the manufacturing/inspection apparatus for manufacturing or inspecting products such as semiconductor wafer, semiconductor device, exposure mask or liquid crystal device, the charge for use of the manufacturing/inspection apparatus is set based on the manufacturing or inspection difficulty information of the product manufactured or inspected with the manufacturing/inspection apparatus and the running information of the manufacturing/inspection apparatus stored in a physical memory medium.
申请公布号 US2001047216(A1) 申请公布日期 2001.11.29
申请号 US20010811714 申请日期 2001.03.19
申请人 ANDO HIROYOSHI 发明人 ANDO HIROYOSHI
分类号 G03F7/20;H01L21/02;H01L21/027;(IPC1-7):G06F19/00 主分类号 G03F7/20
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