发明名称 Exposure apparatus and device manufacturing apparatus and method
摘要 A device manufacturing apparatus includes data acquiring means for acquiring two or more types of fluctuation information on fluctuation in optical characteristics of a projection optical system in the device manufacturing apparatus, adjusting means for adjusting the optical characteristics of the projection optical system, and arithmetic operation means for calculating an adjustment amount, to be instructed to the adjusting means, on the basis of a change characteristic model formula of the optical characteristics and data obtained by the data acquiring means. Only a small part of two or more types of fluctuation information is actually measured, and the other fluctuation information is obtained by arithmetic operation using the actual measurement value, or by looking up a table.
申请公布号 US2001046041(A1) 申请公布日期 2001.11.29
申请号 US20010813168 申请日期 2001.03.21
申请人 HIRANO SHINICHI 发明人 HIRANO SHINICHI
分类号 G03F7/20;H01L21/027;(IPC1-7):G03B1/00 主分类号 G03F7/20
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