发明名称 |
Method and device for measuring structures on a transparent substrate |
摘要 |
A measuring device for measuring structures on a transparent substrate includes an incident-light illuminating device, an imaging device, and a detector device for the imaged structures and a measuring stage for receiving the substrate. The stage is displaceable in an interferometrically measurable fashion perpendicularly to and relative to an optical axis of the imaging device. The measuring stage is designed as an open frame with a receiving edge for the substrate. A transmitted-light illuminating device is provided beneath the measuring stage. The optical axis of the transmitted light illuminating device is aligned with that of the incident-light illuminating device.
|
申请公布号 |
US6323953(B1) |
申请公布日期 |
2001.11.27 |
申请号 |
US19990240681 |
申请日期 |
1999.02.02 |
申请人 |
LEICA MICROSYSTEMS WETZLAR GMBH |
发明人 |
BLAESING-BANGERT CAROLA;RINN KLAUS;KACZYNSKI ULRICH;BECK MATHIAS |
分类号 |
G01B11/00;G01B11/02;G01B11/03;G02B21/08;G03F1/00;G03F7/20;(IPC1-7):G01N21/00;G01N21/88;G01B11/14 |
主分类号 |
G01B11/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|