发明名称 Method and device for measuring structures on a transparent substrate
摘要 A measuring device for measuring structures on a transparent substrate includes an incident-light illuminating device, an imaging device, and a detector device for the imaged structures and a measuring stage for receiving the substrate. The stage is displaceable in an interferometrically measurable fashion perpendicularly to and relative to an optical axis of the imaging device. The measuring stage is designed as an open frame with a receiving edge for the substrate. A transmitted-light illuminating device is provided beneath the measuring stage. The optical axis of the transmitted light illuminating device is aligned with that of the incident-light illuminating device.
申请公布号 US6323953(B1) 申请公布日期 2001.11.27
申请号 US19990240681 申请日期 1999.02.02
申请人 LEICA MICROSYSTEMS WETZLAR GMBH 发明人 BLAESING-BANGERT CAROLA;RINN KLAUS;KACZYNSKI ULRICH;BECK MATHIAS
分类号 G01B11/00;G01B11/02;G01B11/03;G02B21/08;G03F1/00;G03F7/20;(IPC1-7):G01N21/00;G01N21/88;G01B11/14 主分类号 G01B11/00
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