发明名称 Method of producing a thin-film capacitor
摘要 A thin-film capacitor having a perovskite-structured polycrystalline oxide thin-film as its dielectric, that exhibits an excellent insulation property is provided. This capacitor comprises a perovskite-structured, polycrystalline oxide thin-film, and top and bottom electrodes located at each side of the thin-film. The perovskite-structured, polycrystalline oxide thin-film has a general formula of ABO3, where A is at least one element selected from the group consisting of bivalent metallic elements, lead, and lanthanum, and B is at least one element selected from the group consisting of quadrivalent metallic elements. A ratio of (A/B) is in a range from 1.1 to 2.0. The oxide thin-film has granular crystal grains. The perovskite-structured, polycrystalline oxide thin-film is formed by forming a perovskite-structured, amorphous oxide thin-film and by crystallizing the perovskite-structured, amorphous oxide thin-film due to heat treatment.
申请公布号 US6323057(B1) 申请公布日期 2001.11.27
申请号 US20000635174 申请日期 2000.08.09
申请人 NEC CORPORATION 发明人 SONE SHUJI
分类号 H01L27/04;H01L21/314;H01L21/316;H01L21/822;H01L21/8246;H01L27/105;H01L29/92;(IPC1-7):H01L21/824;H01L21/16 主分类号 H01L27/04
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