发明名称 |
LAMINATED FILM AND METHOD OF FORMING LAMINATED FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a laminated film which is formed by laminating a metal oxide thin film and a metal thin film alternately in a number of layers on a base and which is useful as a transparent conductive thin film or a heat wave reflecting film disposed in front of PDP and is of low resistance and excellent in conductivity. SOLUTION: In the laminated film of the metal oxide thin film 2 and the metal thin film 3 formed on the base 1, a layer 4 of an oxide of the metal constituting the metal thin film is formed on the interface of the metal thin film 3 with the metal oxide thin film 2. In the method of forming the laminated film wherein the metal oxide thin film 2 and the metal thin film 3 are formed by laminating the base 1 with a sputtering process, the layer 4 of the oxide is formed by exposing the metal thin film 3 to an oxygen gas atmosphere after this film is formed.
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申请公布号 |
JP2001328198(A) |
申请公布日期 |
2001.11.27 |
申请号 |
JP20000146892 |
申请日期 |
2000.05.18 |
申请人 |
BRIDGESTONE CORP |
发明人 |
IWABUCHI YOSHINORI;KUSANO YUKIHIRO;YOSHIKAWA MASAHITO |
分类号 |
B32B9/00;C23C14/34;H01B5/14;(IPC1-7):B32B9/00 |
主分类号 |
B32B9/00 |
代理机构 |
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地址 |
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