发明名称 Container structure for floating gate memory device and method for forming same
摘要 A floating gate memory device comprises a first conductive floating gate layer which is horizontally oriented and a second conductive floating gate layer which is predominantly vertically oriented. The second layer contacts the first layer to make electrical contact therewith and also defines a recess. A control gate is formed within the recess. Having the control gate formed in the floating gate layer recess increases the capacitive coupling between the floating and control gates thereby improving the electrical properties of the cell and allowing for a reduction in cell size while maintaining
申请公布号 US6323514(B1) 申请公布日期 2001.11.27
申请号 US19990348725 申请日期 1999.07.06
申请人 MICRON TECHNOLOGY, INC. 发明人 KAO DAVID Y.
分类号 H01L21/28;H01L29/423;(IPC1-7):H01L29/788 主分类号 H01L21/28
代理机构 代理人
主权项
地址