| 发明名称 |
Apparatus for photoelectrochemical polishing of silicon wafers |
| 摘要 |
A photochemical polishing apparatus is disclosed in which the electromagnetic waves are provided by a waveguide in close proximity to the surface of a silicon wafer electrode.
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| 申请公布号 |
US6319370(B1) |
申请公布日期 |
2001.11.20 |
| 申请号 |
US20000564102 |
申请日期 |
2000.05.03 |
| 申请人 |
RODEL HOLDINGS INC. |
发明人 |
SUN LIZHONG;SHEN JAMES;COOK LEE MELBOURNE |
| 分类号 |
C25F3/30;H01L21/3063;(IPC1-7):C25F7/00 |
主分类号 |
C25F3/30 |
| 代理机构 |
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