发明名称 DISPLAY DEVICE FOR PLASMA ADDRESS AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a barrier rib featured with processing characteristics and precise scaling in manufacturing a display device for a plasma address. SOLUTION: In order to manufacture a display device for a plasma address, at first, electrodes 9 for a discharge are formed in a row at an under substrate 8. Then, a structural material with the linear barrier rib 10 integrally prepared, is intervened between the under substrate 8 and an intermediate substrate 3 and both the substrates are combined together as they are. Then, a dischargeable gas is filled in the space separated through each barrier rib 10 between the substrate 3 and the substrate 8. Finally, an upper substrate 4 in which columnar electrodes 55 are formed previously is adhered to the intermediate substrate 3 in a given interval, and a liquid crystal 7 is distributed in each interval.
申请公布号 JP2001319573(A) 申请公布日期 2001.11.16
申请号 JP20000137556 申请日期 2000.05.10
申请人 SONY CORP 发明人 WATANABE SHINJI
分类号 G02F1/1333;G09F9/00;H01J9/26;H01J11/22;H01J11/24;H01J11/34;H01J11/36;H01J11/48;H01J11/54;(IPC1-7):H01J9/26;G02F1/133;H01J11/02 主分类号 G02F1/1333
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