发明名称 METHOD FOR FORMING ALIGNMENT LAYER AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for forming an alignment layer completely removing air bubbles included in a polymer solution film and imparting excellent flatness and uniformity and high degree of cross linking to the alignment layer and to provide a method for manufacturing a liquid crystal device. SOLUTION: The polymer solution film 19A is formed on a surface of a substrate 11 by coating it with the polymer solution in which an aligning polymer or its precursor is dissolved. Next, at least a part of the polymer solution film 19A in the vicinity of the surface is dried and cured by vacuum drying the polymer solution film 19A. Next, an aligning polymer film 19B is formed by heating and baking the polymer solution film 19A after vacuum drying, under normal pressure. Finally, the alignment layer 19 is formed by rubbing the surface of the aligning polymer film 19B.
申请公布号 JP2001318382(A) 申请公布日期 2001.11.16
申请号 JP20000137221 申请日期 2000.05.10
申请人 SEIKO EPSON CORP 发明人 HONDA KENICHI
分类号 G02F1/1337;(IPC1-7):G02F1/133 主分类号 G02F1/1337
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