发明名称 |
FAR INFRARED RADIATION HEATER SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a far infrared radiation heater substrate that is superior in thermal shock resistance, and in far infrared radiation performance. SOLUTION: This is the far infrared radiation heater substrate 4 comprised that a pattern layer 2 composed of a metal heating resistor is baked on a crystallized glass 1. It is preferable that the pattern layer 2 is coated by an over coat glass 3. |
申请公布号 |
JP2001319761(A) |
申请公布日期 |
2001.11.16 |
申请号 |
JP20000136209 |
申请日期 |
2000.05.09 |
申请人 |
NARUMI CHINA CORP |
发明人 |
HATONO TETSUO;SHIMIZU AKINORI |
分类号 |
H05B3/86;H05B3/10;(IPC1-7):H05B3/86 |
主分类号 |
H05B3/86 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|