发明名称 FAR INFRARED RADIATION HEATER SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a far infrared radiation heater substrate that is superior in thermal shock resistance, and in far infrared radiation performance. SOLUTION: This is the far infrared radiation heater substrate 4 comprised that a pattern layer 2 composed of a metal heating resistor is baked on a crystallized glass 1. It is preferable that the pattern layer 2 is coated by an over coat glass 3.
申请公布号 JP2001319761(A) 申请公布日期 2001.11.16
申请号 JP20000136209 申请日期 2000.05.09
申请人 NARUMI CHINA CORP 发明人 HATONO TETSUO;SHIMIZU AKINORI
分类号 H05B3/86;H05B3/10;(IPC1-7):H05B3/86 主分类号 H05B3/86
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