首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
VERFAHREN ZUR KORROSIONSSCHUTZBEHANDLUNG WASSERFÜHRENDER METALLSYSTEME
摘要
申请公布号
AT207553(T)
申请公布日期
2001.11.15
申请号
AT19980101043T
申请日期
1998.01.22
申请人
METAKORIN WASSER-CHEMIE GMBH
发明人
SCHMIDT, PETER;WONS, WERNER
分类号
C23F11/18;(IPC1-7):C23F11/18
主分类号
C23F11/18
代理机构
代理人
主权项
地址
您可能感兴趣的专利
N-Sulfonyloxyimid-derivate und sie enthaltende strahlungsempfindliche Harzzusammensetzungen
FLASH MEMORY WITH INTEGRATED MALE AND FEMALE CONNECTORS
APPARATUS AND METHOD FOR COMPENSATING SOFTWARE TIME IN SLEEP MODE PROVIDING PROCESSORS
DRY REGENERABLE SORBENT FOR CARBON OXIDE CAPTURE AND METHOD FOR MANUFACTURING THEREOF
STRUCTURE FOR TENSION OF A PRINTING PAPER
LAMP SHADE PACKING BOX AND THE SEPARATING APPARATUS MAKING THE SAME
SYSTEM FOR ADJUSTING INNER-PRESSURE OF A VEHICLE
SHUTTER DEVICE FOR CAMERA LENS ASSEMBLY
APPARATUS AND METHOD FOR AUDIO MUTE RELEASE SOFTLY
BLINKING BRAKING SYSTEM
HORIZONTAL RECOGNITION MEMBER FOR CONCRETE
SIMULATION MODEL OF RESISTOR AND SIMULATION METHOD USING SUCH A MODEL
METHOD FOR FORMING COPPER WIRING OF SEMICONDUCTOR DEVICE USING SINGLE DAMASCENE PROCESS
METHOD FOR FORMING GATE OF SEMICONDUCTOR DEVICE
POLISHING PAD CONDITIONING DEVICE IN CMP PROCESS
NOVEL L-LYSINE-INDUCIBLE PROMOTER
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
SPECIMEN ROD AND HOLDER FOR PREVENTING GENERATING PARTICLES USED FOR SEMICONDUCTOR INSPECTION APPARATUS
APPARATUS FOR SUPPLYING SLURRY IN CMP PROCESS
A METHOD FOR FABRICATING A DAMASCENE OF A SEMICONDUCTOR DEVICE
