HIGH-DENSITY PLASMA SOURCE FOR IONIZED METAL DEPOSITION,申请号KR1020017010151-传众专利搜索

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发明名称	HIGH-DENSITY PLASMA SOURCE FOR IONIZED METAL DEPOSITION
摘要
申请公布号	KR20010102054(A)	申请公布日期	2001.11.15
申请号	KR1020017010151	申请日期	2001.08.10
申请人		发明人
分类号	H01J37/34	主分类号	H01J37/34
代理机构		代理人
主权项
地址

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