发明名称 Apparatus and method for objective measurement of optical systems using wavefront analysis
摘要 <p>An apparatus for determining aberrations of an eye includes a patient head rest allowing for positioning adjustment. The patient head rest is operable with an optical table having a base. The base includes a probe beam generating apparatus, probe beam directing optics which itself comprises a beam splitter; a mirror; and a lens. The probe beam directing optics is capable of directing a probe beam toward an eye of a patient positioned on the patient head rest. Video image components are provided and comprise a light source, a mirror; and a video camera. The video image components are capable of generating an image of an eye of a patient positioned on the patient head rest. Eye fixation components generate a target that the eye of a patient positioned on the patient head rest can view. The eye fixation components comprise a fixation target, a light source, a lens, and a mirror. Wavefront directing and analyzing components measure a wavefront emanating from the eye of a patient positioned on the patient head rest and determine aberrations of the eye that range from at least about + or - 1 diopters to at least about + or - 6 diopters. The wavefront directing and analyzing components include a lens; a mirror, a microlens array, a camera, and a data processor. <IMAGE></p>
申请公布号 EP1153570(A1) 申请公布日期 2001.11.14
申请号 EP20010201252 申请日期 2001.04.05
申请人 ALCON, INC 发明人 FREY, RUDLPH W.;BURKHALTER, JAMES H.;ZEPKIN, NEIL;POPPELIERS, EDWARD;CAMPIN, JOHN ALFRED
分类号 A61B3/10;A61B3/103;A61B3/15;G01J9/00;(IPC1-7):A61B3/103;A61B3/04 主分类号 A61B3/10
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