发明名称 Easy to manufacture integrated semiconductor memory configuration with platinum electrodes
摘要 The integrated semiconductor memory configuration has a semiconductor body in which selection transistors and storage capacitors are integrated. The storage capacitors have a dielectric layer configured between two electrodes. At least the upper electrode is constructed in a layered manner with a platinum layer, that is seated on the dielectric layer, and a thicker, base metal layer lying above the platinum layer.
申请公布号 US6316802(B1) 申请公布日期 2001.11.13
申请号 US19990282091 申请日期 1999.03.30
申请人 INFINEON TECHNOLOGIES AG 发明人 SCHINDLER GüNTHER;HARTNER WALTER;HINTERMAIER FRANK;MAZURE-ESPEJO CARLOS;BRUCHHAUS RAINER;HOENLEIN WOLFGANG;ENGELHARDT MANFRED
分类号 H01L27/10;H01L21/822;H01L21/8242;H01L21/8246;H01L27/04;H01L27/105;H01L27/108;H01L27/115;(IPC1-7):H01L27/108 主分类号 H01L27/10
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