发明名称 METHOD FOR FORMING A FINE RESIST PATTERN APPLYING A WATER-SOLUBLE RESIN COMPOSITION
摘要 <p>A water-soluble resin composition comprising (1) a water-soluble resin, (2) a water-soluble crosslinking agent, (3) at least one of surface active agents selected from acetylene alcohols, acetylene glycols, polyethoxylates of acetylene alcohols and polyethoxylates of acetylene glycols, and (4) a solvent consisting of water or a mixture of water and a water-soluble solvent. This water-soluble resin composition is applied onto a resist pattern, then heated to crosslink by an acid supplied from the resist, followed by development to remove the non-crosslinked water-soluble resin coating layer. This water-soluble resin composition is excellent in coating characteristics on steps of resist patterns and in dimensional regulation upon fining of patterns so that resist patterns such as trench patterns and hole patterns can effectively be fined.</p>
申请公布号 EP1152036(A1) 申请公布日期 2001.11.07
申请号 EP20000937263 申请日期 2000.06.16
申请人 AZ ELECTRONIC MATERIALS USA CORP. 发明人 KANDA, TAKASHI;TANAKA, HATSUYUKI
分类号 G03F7/40;H01L21/027;C08K5/05;C08K5/16;C08L29/04;C08L29/14;C08L61/20;C08L71/02;C08L101/14;G03F7/00;G03F7/004;G03F7/11;(IPC1-7):C08L101/14;C08K5/06 主分类号 G03F7/40
代理机构 代理人
主权项
地址