| 发明名称 |
Method and device for processing semiconductor material |
| 摘要 |
There are a device and method for protecting semiconductor material, wherein semiconductor material is processed on a surface of stabilized ice made from ultrapure water and particles of semiconductor material.
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| 申请公布号 |
US6313013(B1) |
申请公布日期 |
2001.11.06 |
| 申请号 |
US19990410623 |
申请日期 |
1999.10.01 |
| 申请人 |
WACKER-CHEMIE GMBH |
发明人 |
FLOTTMANN DIRK;AST GERHARD;WOLF REINHARD |
| 分类号 |
B02C19/18;C30B15/00;C30B15/02;C30B29/06;C30B35/00;H01L21/208;(IPC1-7):H01L21/322;H01L21/00 |
主分类号 |
B02C19/18 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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