| 摘要 |
PURPOSE: Provided is a group of novel homologous eight membered ring compounds having a metal, such as copper, reversibly bound in the ring and containing carbon, nitrogen, silicon and/or other metals. Also, provided is deposition of metal and metal-containing films on a substrate, under ALD or CVD conditions, using the above novel compounds as precursors. CONSTITUTION: The compound is represented by the formula(1), wherein M and M' are each a metal; X and X' are each N or O; Y and Y' are each Si, C, Sn, Ge, B, or Al; Z and Z' are each C, N, or O; R1, R2, R1', and R2' are each independently H, an alkyl, an alkenyl, an alkynyl, a partially fluorinated alkyl, an aryl, an alkyl-substituted aryl, a partially fluorinated aryl, a fluoralkyl-substituted aryl, a trialkylsiloxy, a triarylsiloxy, a trialkylsilyl, or a triarylsilyl; R3, R4, R3', and R4' are each independently H, an alkyl, a partially fluorinated alkyl, a trialkyl siloxy, an aryl, an alkyl-substituted aryl, a partially fluorinated aryl, a fluoroalkyl-substituted aryl, an alkoxy, a trialkylsiloxy, a triarylsiloxy, a trialkylsilyl, a triarylsilyl, a bis(trialkylsilyl)amido, a bis(triarylsilyl)amido, or a halogen; and R5, R6, R5', and R6' are each independently H, an alkyl, an alkenyl, an alkynyl, a partially fluorinated alkyl, an aryl, an alkyl-substituted aryl, a partially fluorinated aryl, a fluoralkyl-substituted aryl, a halogen, a trialkylsiloxy, a triarylsiloxy, a trialkylsilyl, a triarylsilyl, a trialkylsilanoate, or an alkoxy; provided that when X and X' are each O, there is no substitution at R2 and R2'; further provided that when Z and Z' are each O, there is no substitution at R5, R6, R5', or R6'; said alkyl and alkoxide having 1 to 8 carbons; said alkenyl and alkynyl having 2 to 8 carbons; and said aryl having 6 carbons.
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