PHOTOMASK AND LEVELING MANAGEMENT METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a photomask which can manage the presence or absence of a level difference at an exposure surface and a leveling management method using the same. SOLUTION: This photomask has a pattern for leveling management formed in a region consisting of a mask material for halftones. The pattern for leveling management has the first hole pattern for level difference inspection consisting of an approximate circle in the diameter (a) of a plane shape and the second hole pattern for level difference inspection consisting of an approximate circle in the diameter (a) of a plane shape. The spacing between the center of the first hole pattern for level difference inspection and the center of the second hole pattern for level difference inspection is confined to <=5a.