| 摘要 |
PROBLEM TO BE SOLVED: To prevent such foreign matters as contaminants from being interposed between the holding surface of a substrate holding means and a substrate. SOLUTION: In the inside of a cleaning apparatus 50 for a substrate holding means, a clean transcriptional material F is provided in a feedable and movable way by a transcriptional-material holding means 57. The cleaning apparatus 50 is so disposed above a rotation type substrate coating apparatus 1 as to instruct its operational start by an operational panel 59. According to a cleaning flow, a sputter preventing cup 9 is so lowered as to contact a plane portion of the transcriptional material F with a sucking surface 2a of the substrate holding means. By this contact, the foreign matters of the sucking surface 2a are transcribed on the transcriptional material F to remove the foreign matters therefrom. The cleaning apparatus 50 so repeats the transcriptional process comprising the contact of the transcriptional material F with the sucking surface 2a and the changeover of the plane portion of the transcriptional material F as to clean enough the sucking surface 2a.
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