发明名称 WERKWIJZE VOOR HET VERVAARDIGEN VAN EEN PLANAIRE MICROEELEKTRONISCHE INRICHTING, EN DAARMEE VERKREGEN INRICHTING.
摘要 In a magnetic bubble domain circuit, a conductive layer 13 on a garnet substrate 10 is etched to form conductor patterns. The grooves through the layer 13 are filled with an insulating material, e.g. a glass, 21, 22, 23, to provide a flat surface. Therefore when an insulating layer and patterned permalloy overlay 25 are subsequently provided, there are no steps in the overlay. This eliminates a source of defects and the uniform spacing of the overlay from the substrate results in better operating characteristics. The same technique, employing a flat surface, can be used in semiconductor circuits. <IMAGE>
申请公布号 NL7905689(A) 申请公布日期 1980.01.29
申请号 NL19790005689 申请日期 1979.07.23
申请人 ROCKWELL INTERNATIONAL CORPORATION TE EL SEGUNDO, CALIFORNIEE, VER.ST.V.AM. 发明人
分类号 G11C11/14;H01F10/06;H01F41/14;H01F41/34;H01L21/48;H01L21/768;H01L23/522;(IPC1-7):05K3/00;01L27/12;11C19/08 主分类号 G11C11/14
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