PHOTOMASK BLANK, PHOTOMASK AND METHOD FOR MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To obtain a photomask blank of a chromium system having high intra-surface uniformity, good controllability in manufacture and high-quality by using sputtering gas containing at least carbon dioxide and inert gas in depositing a chromium system film by a reactive sputtering method and a photomask. SOLUTION: This photomask blank formed with at least one layer of the chromium system film on a transparent substrate is constituted by depositing the chromium-base film by the reactive sputtering method using chromium or the chromium containing at least one kind of oxygen, nitrogen and carbon and using the sputtering gas containing at least the carbon dioxide and the inert gas.