| 摘要 |
PROBLEM TO BE SOLVED: To remove a resist layer from a substrate to suppress the substrate exposed from the resist layer from corrosion. SOLUTION: The system comprises a container 1 made of stainless steel, etc., for defining a reactor chamber, exhaust hole 2 for exhausting the container 1, heater 4 for heating a substrate 3 mounted on a means for supporting a semiconductor substrate, etc., gas inlet pipe 5 for introducing a gas into the container 1, dielectric window 6 for isolating the interior of the container but allowing a high frequency power to pass through, and high frequency power feeder 7 for feeding a high-frequency power such as microwave power. |
