| 摘要 |
PROBLEM TO BE SOLVED: To make a contribution to prevention of the degradation in the throughput of an exposure stage without degrading the quality of a device even if exposure regions are exposed partly in overlap. SOLUTION: A mask and a substrate are synchronously moved and the patterns of the mask are exposed onto a substrate via a projection optical system. When the exposure regions 34c and 34d of the substrate subjected to projection exposing by the projection optical system are exposed partly in overlap, the image forming surfaces of the patterns of the substrate and the mask are moved relatively over a prescribed range in a direction nearly perpendicular to the substrate. |
