发明名称 |
RESIST STRIPPER COMPOSITION |
摘要 |
The present invention relates to a resist stripper composition that is used to remove resists during semiconductor device manufacturing processes such as for large size integrated circuits, very large size integrated circuits, etc. The resist stripper composition comprises 3 to 10 wt% of an organic amine compound, 30 to 60 wt% of a solvent selected from a group consisting of DMAc, DMF, DMI, NMP, etc., 30 to 60 wt% of water, 1 to 10 wt% of catechol, resorcin or a mixture thereof and 1 to 10 wt% of a C4-6 straight polyhydric alcohol. |
申请公布号 |
WO0182002(A1) |
申请公布日期 |
2001.11.01 |
申请号 |
WO2001KR00692 |
申请日期 |
2001.04.25 |
申请人 |
DONGJIN SEMICHEM CO., LTD.;YOON, SUK-IL;PARK, YOUNG-WOONG;OH, CHANG-IL;LEE, SANG-DAI;YOO, CHONG-SOON |
发明人 |
YOON, SUK-IL;PARK, YOUNG-WOONG;OH, CHANG-IL;LEE, SANG-DAI;YOO, CHONG-SOON |
分类号 |
G03F7/42;H01L21/027 |
主分类号 |
G03F7/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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