发明名称 METHOD AND DEVICE FOR CONDITIONING ATMOSPHERE IN A PROCESS CHAMBER
摘要 <p>The invention concerns a method for conditioning the atmosphere in a process chamber (1) using a primary pump (3), a secondary pump (2), means controlling (6, 7) the primary pump speed, and at least first gas analysing means (9) adapted to analyse the gases sucked upstream of the primary pump (3) and to produce first analysing signals (10). First signal processing means (6) control the pumping speed on the basis of the first analysing signals (10) so as to determine the evolution of pressure in the process chamber (1) during the treatment transitory phases. Thus, deposits and turbulence are avoided in the process chamber (1), and deposits in the pumping line, so that the secondary pump (2) can be placed immediately proximate to the process chamber (1).</p>
申请公布号 WO0182019(A1) 申请公布日期 2001.11.01
申请号 WO2001FR01220 申请日期 2001.04.20
申请人 ALCATEL 发明人 BERNARD, ROLAND;CHEVALIER, ERIC;SOGAN, GLORIA
分类号 C23C16/44;G05D16/20;G05D27/02;H01L21/00;H01L21/205;(IPC1-7):G05D27/02 主分类号 C23C16/44
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