发明名称 Diode and method for manufacturing the same
摘要 A diode is provided which includes a first-conductivity-type cathode layer, a first-conductivity-type drift layer placed on the cathode region and having a lower concentration than the cathode layer, a generally ring-like second-conductivity-type ring region formed in the drift layer, second-conductivity-type anode region formed in the drift layer located inside the ring region, a cathode electrode formed in contact with the cathode layer, and an anode electrode formed in contact with the anode region, wherein the lowest resistivity of the second-conductivity-type anode region is at least {fraction (1/100)} of the resistivity of the drift layer, and the thickness of the anode region is smaller than the diffusion depth of the ring region.
申请公布号 US2001035560(A1) 申请公布日期 2001.11.01
申请号 US20010793032 申请日期 2001.02.26
申请人 FUJI ELECTRIC CO., LTD. 发明人 FUJIHIRA TATSUHIKO;MIYASAKA YASUSHI
分类号 H01L29/872;H01L21/329;H01L29/47;H01L29/861;(IPC1-7):H01L27/095;H01L31/108;H01L29/04;H01L29/812;H01L31/036;H01L31/07 主分类号 H01L29/872
代理机构 代理人
主权项
地址