发明名称 EXPOSURE APPARATUS AND EXPOSURE METHOD
摘要 PURPOSE: An exposure apparatus and exposure method are provided to prevent the generation of twisting motion of a stage without installing the driving guide in the stage which intercepts light beam. CONSTITUTION: A stage(10) is laterally surrounded by the window frame guide which is a four member rectangular structure. The four members are a top member(40A), a bottoms member(40B), a lefthand member(40C), and a righthand member(40D). The four members(40A-40D) are of any material having high specific stiffness such as aluminum or a composite material. These four members(40A-40D) are attached together by hinge structures which allow non-rigid movement of the four members relative to one another in the X-Y plane and about the Z-axis. Each hinge(44A,44B,44C,44D) is one or more metal flexures allowing a slight flexing of the window frame guide structure.
申请公布号 KR100314554(B1) 申请公布日期 2001.10.31
申请号 KR19990025871 申请日期 1999.06.30
申请人 NIKON CORPORATION 发明人 LEE MARTIN E.
分类号 G03F7/22;G03F7/20;G03F9/00;H01L21/027;H01L21/68;(IPC1-7):H01L21/027 主分类号 G03F7/22
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