摘要 |
PURPOSE: An exposure apparatus and exposure method are provided to prevent the generation of twisting motion of a stage without installing the driving guide in the stage which intercepts light beam. CONSTITUTION: A stage(10) is laterally surrounded by the window frame guide which is a four member rectangular structure. The four members are a top member(40A), a bottoms member(40B), a lefthand member(40C), and a righthand member(40D). The four members(40A-40D) are of any material having high specific stiffness such as aluminum or a composite material. These four members(40A-40D) are attached together by hinge structures which allow non-rigid movement of the four members relative to one another in the X-Y plane and about the Z-axis. Each hinge(44A,44B,44C,44D) is one or more metal flexures allowing a slight flexing of the window frame guide structure. |