发明名称 Semiconductor circuit apparatus and method for fabricating the semiconductor circuit apparatus
摘要 A monolithically integrated semiconductor circuit apparatus includes circuit elements disposed on a semiconductor substrate. The circuit elements include at least one semiconductor memory device, drive circuits, and a digital logic component monolithically integrated on the semiconductor substrate. A first contact-making plane is provided which is closer to a main surface of the semiconductor substrate than a penultimate contact-making plane, which is closer to the main surface of the semiconductor substrate than a last contact-making plane. The first, penultimate, and last interconnect patterns electrically interconnect the plurality of circuit elements. A protection device is formed at least in a partial region of the penultimate interconnect pattern. The protection device includes at least a fuse or an antifuse and is assigned to a redundancy activation for defective memory cells and memory cell groups in the semiconductor memory device. The invention furthermore relates to a method for fabricating such a monolithically integrated semiconductor circuit apparatus.
申请公布号 US6310396(B1) 申请公布日期 2001.10.30
申请号 US19990472221 申请日期 1999.12.27
申请人 INFINEON TECHNOLOGIES AG 发明人 KANITZ SVEN
分类号 H01L23/525;(IPC1-7):H01L23/48;H01L23/52;H01L29/40 主分类号 H01L23/525
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