发明名称 |
Composition for reflection reducing coating |
摘要 |
The anti-reflective coating composition comprising at least perfluoroalkylsulfonic acid (A) represented by the general formula: CnF2n+1SO3H (n is an integer of 4 to 8), organic amine (B), water-soluble polymer (C), perfluoroalkyl sulfonamide (D) represented by the general formula: CnF2n+1SO2NH2 (n is an integer of 1 to 8) and water (E) and having a pH value of 1.3 to 3.3 is applied onto a photoresist film formed on a substrate, thus forming an anti-reflective coating. The photoresist and anti-reflective coating are then exposed to light and developed to give a resist pattern. The coating composition can form a uniform anti-reflective coating free of standing wave, multiple reflection, T-top and PED (Post Exposure Delay) in a small amount of drip onto any types of resists regardless of the surface shape of a substrate.
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申请公布号 |
US6309789(B1) |
申请公布日期 |
2001.10.30 |
申请号 |
US20000485087 |
申请日期 |
2000.05.25 |
申请人 |
CLARIANT FINANCE (BVI) LIMITED;DAINIPPON INK AND CHEMICALS, INC. |
发明人 |
TAKANO YUSUKE;TANAKA HATSUYUKI;TAKANO KIYOFUMI;HASHIMOTO YUTAKA |
分类号 |
G03F7/004;C09D5/00;C09D7/12;C09D133/02;C09D139/06;G03F7/09;G03F7/11;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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