发明名称 Projection exposure method and apparatus
摘要 In projection exposure of isolated pattern such as a contact hole, in order to increase the depth of focus a coherence reducing member is disposed on a Fourier transform plane in an image-forming optical path between a mask and a sensitized base, so that coherence is reduced between image-forming beams respectively passing through a plurality of different, concentric regions around the optical axis of the projection optical system on the Fourier transform plane. The coherence reducing member may be a polarization state control member for making a difference in polarization state, a member for making a difference in optical path length, or space filters with different shapes.
申请公布号 US6310679(B1) 申请公布日期 2001.10.30
申请号 US19990332148 申请日期 1999.06.14
申请人 NIKON CORPORATION 发明人 SHIRAISHI NAOMASA
分类号 G03F7/20;(IPC1-7):G03B27/42;G03B27/52;G03B27/54;G03B27/32 主分类号 G03F7/20
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