发明名称 Anti-parallel longitudinal patterned exchange biased dual stripe magnetoresistive (DSMR) sensor element and method for fabrication thereof
摘要 A dual stripe magnetoresistive (DSMR) sensor element, and a method for fabricating the dual stripe magnetoresistive (DSMR) sensor element. When fabricating the dual stripe magnetoresistive (DSMR) sensor element while employing the method, there are employed two pair of patterned longitudinal magnetic biasing layers formed of a single longitudinal magnetic biasing material longitudinally magnetically biased in substantially anti-parallel directions. When longitudinally magnetically biasing the second pair of patterned longitudinal magnetic biasing layers there is employed a thermal annealing method employing a thermal annealing temperature, a thermal annealing exposure time and an extrinsic magnetic bias field strength such that the pair of longitudinally magnetically biased patterned first longitudinal magnetic biasing layers is not substantially demagnetized.
申请公布号 US6310751(B1) 申请公布日期 2001.10.30
申请号 US19980182775 申请日期 1998.10.30
申请人 HEADWAY TECHNOLOGIES, INC. 发明人 GUO YIMIN;JU KOCHAN;WANG HUI-CHUAN;LIAO SIMON H.
分类号 G01R33/09;G11B5/31;G11B5/39;(IPC1-7):G11B5/39 主分类号 G01R33/09
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