发明名称 Method of and apparatus for coating a substrate with a coating material having an even thickness
摘要 A substrate is placed on a support surface of a table. The support surface has a flatness of 2 mum or less. The table has a plurality of holes in the surface. A vacuum is created in the holes to bring the substrate into close contact with the support surface. This eliminates deformations of the substrate, such as twisting and curving. A coating die is moved above the table to apply a coating material onto the substrate. Consequently, a coating having a constant thickness is formed on the substrate.
申请公布号 US6309692(B1) 申请公布日期 2001.10.30
申请号 US19980101989 申请日期 1998.07.22
申请人 CHUGAI RO CO., LTD. 发明人 NAKAMURA MASAHIRO;YOKOYAMA TAKUYA;NISHIO TSUTOMU
分类号 B05C5/02;B05C11/02;B05D1/26;(IPC1-7):B05D1/26 主分类号 B05C5/02
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