| 摘要 |
PROBLEM TO BE SOLVED: To effectively carry out an optical proximity effect correction and to suppress significant increase in the number of patterns by addition of auxiliary patterns. SOLUTION: This device has a computer 15 for forming the data of the correction patterns, in order to manufacture a photomask formed with the correction patterns added with the auxiliary patterns respectively to both angles of the original pattern, having a perpendicular angle at both ends of one side by electron beam exposure. The computer 15 is inputted with the data of the original pattern (S1), adds the triangle shape or square shape which have a side extending the one side and the side which is part of the sides adjacent to this one side as the auxiliary patterns to the original pattern (S2), forms the OR pattern of the original pattern and the auxiliary patterns (S3) and separates the OR pattern into basic patterns which are processable by the electron beam exposure system (S4). |
