| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing technique by which the cost of consumables, such as the abrasive, polishing cloth, etc., can be suppressed by suppressing the occurrence of scratchings, peeling, dishing, and erosion without requiring any complicated cleaning process nor abrasive supplying/treating device. SOLUTION: A metallic film 21 formed on an insulating film 23 having a groove is polished with a polishing solution containing no abrasive grains, but an oxidizing substance and another substance which makes oxides water-soluble.
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