发明名称 |
SUPERCRITICAL FLUID DELIVERY AND RECOVERY SYSTEM FOR SEMICONDUCTOR WAFER PROCESSING |
摘要 |
<p>A continuous flow, steady state fluid delivery and recovery system for a process chamber and processes requiring supercritical fluid and desired additives including co-solvents, for conducting repetitive batch processing operations in an automated environment, for such processes as supercritical carbon dioxide cleaning and processing of semiconductor wafers. The system provides for steady-state operation of fluid flow and byproducts recovery while the process chamber is brought rapidly and repeatedly on and off line as in batch operations and for various process steps.</p> |
申请公布号 |
WO0178911(A1) |
申请公布日期 |
2001.10.25 |
申请号 |
WO2001US12617 |
申请日期 |
2001.04.18 |
申请人 |
S. C. FLUIDS, INC. |
发明人 |
COSTANTINI, MICHAEL;MORITZ, HEIKO;MOUNT, DAVID;JAFRI, IJAZ;HEATHWAITE, RICK;CHANDRA, MOHAN |
分类号 |
H01L21/304;B01J3/00;B08B7/00;H01L21/00;(IPC1-7):B08B3/00 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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