ROTARY SUBSTRATE TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To prevent a chemical from dripping from a chemical discharge nozzle at a low coat in a rotary substrate treatment apparatus. SOLUTION: A closing valve 21b to be opened by an application of a specified liquid pressure in a discharge direction is provided in an upstream side of the chemical discharge nozzle 21a for feeding the chemical to a surface of a substrate 10. A pressure relieving mechanism for relieving a residual pressure in the upstream side of the closing valve 21b at the time of stopping the feed of the chemical is provided in a feed system for feeding the chemical to the chemical discharge nozzle 21a.