发明名称 Another technique for gated lateral bipolar transistors
摘要 An improved structure and method for gated lateral bipolar transistors are provided. Embodiments of the present invention capitalize on opposing sidewalls and adjacent conductive sidewall members to conserve available surface space on the semiconductor chips. Additionally, the gate and body of the transistors are biased to modify the threshold voltage of the transistor (Vt). The conductive sidewall member configuration conserves surface space and achieves a higher density of surface structures per chip. The structures offer performance advantages from both metal-oxide semiconductor (MOS) and bipolar junction transistor (BJT) designs. The devices can be used in a variety of applications, digital and analog, wherever a more compact structure with low power consumption and fast response time is needed.
申请公布号 US6307235(B1) 申请公布日期 2001.10.23
申请号 US19980050728 申请日期 1998.03.30
申请人 MICRON TECHNOLOGY, INC. 发明人 FORBES LEONARD;NOBLE WENDELL P.
分类号 H01L21/331;H01L21/8228;H01L27/082;H01L29/735;H01L29/739;(IPC1-7):H01L29/76 主分类号 H01L21/331
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