DEVICE AND METHOD FOR CLEANING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a device and a method for cleaning a substrate, by which the substrate such as a semiconductor material, ULSI and a wafer can be cleaned with high cleaning effectiveness. SOLUTION: This substrate cleaning device has a substrate cleaning section 5 for cleaning the substrate being a subject to be cleaned by the action of a cleaning liquid on the substrate surface by jetting the cleaning liquid from a supersonic nozzle for generating a supersonic current while accelerating the speed of the cleaning liquid into supersonic one by a compressed gas and an ultraviolet irradiation section 7 for irradiating the substrate, just before or/and just after it is cleaned with the cleaning liquid, with ultraviolet rays in the atmosphere.