发明名称 Process for producing halogenated benzene compound
摘要 The present invention provides a process for producing halogenated benzene compounds. In the process, an organometallic compound represented by the general formula [I]:wherein M represents an R13Sn group, an R13Si group, an R13Ge group, an (R2CO2)Hg group, a ClHg group or an (R3O)2B group wherein each R1 independently represents a C1-C8 alkyl group, R2 represents a C1-C3 alkyl group or a C1-C3 haloalkyl group, R3 represents a hydrogen atom or a C1-C3 alkyl group, n represents an integer of from 0 to 4, m represents an integer of from 0 to 1, each A independently represents a fluorine atom, a nitro group, a cyano group, a C1-C8 alkyl group, a C1-C8 alkoxy group or a C2-C8 acyloxy group, and Q represents an organic residue, is reacted in a solvent with a halide ion represented by the general formula X-, under light irradiation conditions in the presence of a semiconductor catalyst with a photocatalytic activity.
申请公布号 US6307045(B1) 申请公布日期 2001.10.23
申请号 US20000608217 申请日期 2000.06.30
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 KOMORI HIROSHI;NISHIOKA KAZUHIKO
分类号 C07B39/00;C07B59/00;C07C205/12;C07D243/24;C07D243/26;(IPC1-7):C07B39/00;C07C41/22 主分类号 C07B39/00
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