| 摘要 |
PROBLEM TO BE SOLVED: To improve flatness of a polished surface of a glass substrate and polishing efficiency, in relation to a continuous-type polishing device for manufacturing a glass substrate for a liquid crystal display. SOLUTION: In this continuous-type polishing device 10, a polishing pad 28 of a polishing machine 16 is connected to a rotating/revolving mechanism, and the rotating/revolving mechanism rotates and revolves the polishing pad 28 to polish a glass plate G. |
