发明名称 THREE-DIMENSIONAL ATOMIC ARRANGEMENT OBSERVATION SAMPLE FORMING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To directly clarify a point defect in a crystal or an existing state of an impurity atom by three-dimensionally observing an atomic arrangement in a thin-film sample on a single atom level and recognizing its atom species. SOLUTION: In a scanning transmission electron microscope device, having an electric field emission type electron gun 8 with an acceleration voltage of 200 kV higher, a sample finely moving/tilting mechanism 12 allowing sample finely moving control on the order of nanometer and sample tilting control on the order of milliradian, a multichannel electron beam detector 13, and a computer 14 preloaded with controlling software for them and three-dimensional image processing software are constituted into a system, and a plurality of two-dimensional atomic arrangement projection images 6 varying in sample inclinationθare obtained, and then a highly precise three-dimensional atomic arrangement structure is constructed, by performing image processing of these plural image data. In this way, the cause of electric current leakage or an element defect such as a pressure-resistance defect can be analyzed accurately, because a point defect or an impurity atom and the like in a connection part, such as an interface and a contact in a ULSI element, a substrate or a thin film, can be observed directly.</p>
申请公布号 JP2001289754(A) 申请公布日期 2001.10.19
申请号 JP20010041310 申请日期 2001.02.19
申请人 HITACHI LTD 发明人 KAKIBAYASHI HIROSHI;MITSUI YASUHIRO;TODOKORO HIDEO;KURODA KATSUHIRO
分类号 G01N23/04;B82B3/00;G01N1/28;G01Q60/10;G01Q80/00;H01J37/20;H01J37/28;H01J37/30;(IPC1-7):G01N1/28;G01N13/12 主分类号 G01N23/04
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