发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE FILM USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high resolution and excellent in adhesion and removability as a resist and a photosensitive film using the composition. SOLUTION: The photosensitive resin composition contains a binder component (A), a monomer component (B) and a photopolymerization initiator (C). The binder component (A) contains at least a vinyl polymer (A1) having a weight average molecular weight of 50,000-100,000 and 110-170 mgKOH/g acid value and a vinyl polymer (A2) having a weight average molecular weight of 5,000-45,000, 180-300 mgKOH/g acid value and 100-160 deg.C glass transition temperature. The photopolymerization initiator (C) contains at least a lophin dimer (C1).
申请公布号 JP2001290269(A) 申请公布日期 2001.10.19
申请号 JP20000105464 申请日期 2000.04.06
申请人 NICHIGO MORTON CO LTD 发明人 MURAKAMI SHIGERU;HAMADA YASUHIRO
分类号 G03F7/029;C08F2/44;C08F2/50;C08F20/36;C08F290/06;G03F7/004;G03F7/027;G03F7/031;G03F7/033;H05K3/06 主分类号 G03F7/029
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