发明名称 METHOD AND TAPE FOR PEELING
摘要 <p>PROBLEM TO BE SOLVED: To provide a peeling method in which a substance can be prevented from breakage which is generated when the substance is peeled from a fixing tape for fixing the substance at such a machining duration as a back grind step or a dicing step for a semiconductor wafer. SOLUTION: This peeling method has a feature of suctioning (reducing a pressure) from other surface of a tape for peeling when a machining substance is attached with the tape for peeling, especially porous member is preferably used as the tape for peeling and the machining substance is attached, at the time of peeling the machining substance from a fixing tape for machining.</p>
申请公布号 JP2001291760(A) 申请公布日期 2001.10.19
申请号 JP20000343905 申请日期 2000.11.10
申请人 HITACHI CHEM CO LTD 发明人 DOBASHI AKIHIKO;IKETANI TAKUJI;KUWABARA NORIKO
分类号 B65H41/00;H01L21/301;H01L21/304;H01L21/67;H01L21/68;(IPC1-7):H01L21/68 主分类号 B65H41/00
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