| 摘要 |
A plasma treatment apparatus and method are disclosed. The plasma treatment apparatus has a discharge unit with at least one discharge electrode assembly disposed on a generally rectangular-shaped housing in a position that is offset from being coaxial with a longitudinal axis of the discharge unit housing. A plurality of discharge units can be arranged side by side so that their discharge electrodes are alternately disposed with respect to one another in order to treat a wide work surfaces that are wider than the distance between discharge electrodes.
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