发明名称 |
VERFAHREN UND VORRICHTUNG ZUM PLASMASPRITZEN |
摘要 |
<p>A process and apparatus for the plasma deposition of a carbon-rich coating onto a substrate is provided. This method includes the steps of: providing a substrate in a vacuum chamber; and generating a carbon-rich plasma in the vacuum chamber by injecting a plasma gas into a hollow cathode slot system containing a cathode made of two electrode plates arranged parallel to each other, providing a sufficient voltage to create and maintain a carbon-rich plasma in the hollow cathode slot system, and maintaining a vacuum in the vacuum chamber sufficient for maintaining the plasma. The plasma is deposited on the substrate to form a carbon-rich coating.</p> |
申请公布号 |
DE69522694(D1) |
申请公布日期 |
2001.10.18 |
申请号 |
DE1995622694 |
申请日期 |
1995.06.23 |
申请人 |
MINNESOTA MINING AND MFG. CO., ST. PAUL |
发明人 |
KOHLER, GUNTER A.;KIRK, STEH M.;FOLLETT, GARY J. |
分类号 |
C23C4/04;C23C4/12;C23C16/26;C23C16/50;C23C16/513;H01J37/32;(IPC1-7):C23C16/50 |
主分类号 |
C23C4/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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