| 摘要 |
A reflection-reducing film formed by being applied onto the surface of a substrate having light transmitting property, and including a base layer formed on the surface of said substrate and a surface layer formed on the upper side of said base layer, wherein: said base layer has a thickness of from 50 to 200 nm; and said surface layer is formed of a hydrolyzed product of a silane compound represented by the following formula (I), <paragraph lvl="0"><in-line-formula>Rn-Si(X)4-n (I) </in-line-formula> wherein R is a substituted or unsubstituted alkyl group or an alkenyl group, X is a hydrolyzable group, and n is a number of 1 or 2, a metal chelate compound and a silica sol, and has a thickness of from 50 to 200 nm. The reflection-reducing film is easily formed on a light-transmitting substrate by applying a multi-layer coating thereon, and exhibits an excellent liquid resistance.
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